Title of article
Deposition of 10-undecenoic acid self-assembled layers on H–Si(1 1 1) surfaces studied with AFM and FT-IR
Author/Authors
Y.J. Li، نويسنده , , R. Tero، نويسنده , , Herbert T. Nagasawa، نويسنده , , T. Nagata، نويسنده , , T. Urisu، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
4
From page
238
To page
241
Abstract
Self-assembling layers of 10-undecenoic acid (UA) were deposited on H-terminated Si(1 1 1) surfaces and characterized
with atomic force microscopy (AFM) and Fourier-transform infrared (FT-IR) spectroscopy measurements for the first time.
The unique island structures are deposited by layer-by-layer growth mechanism. The IR spectra suggest that the multilayers
grown over the first monolayer are deposited by weak intermolecular interactions such as Van der Waals force and hydrogen
bonding
Keywords
AFM , Si(1 1 1) , FT-IR , 10-Undecenoic acid , Self-assembled layers
Journal title
Applied Surface Science
Serial Year
2004
Journal title
Applied Surface Science
Record number
1000444
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