• Title of article

    Preparation and characterization of Zn–Se bilayer thin film structure

  • Author/Authors

    M. Singh*، نويسنده , , Y.K. Vijay، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2005
  • Pages
    8
  • From page
    79
  • To page
    86
  • Abstract
    ZnSe films were prepared by a stacked elemental layer deposition method on glass substrates at a pressure 10 5 Torr. The films were rapid thermal annealed (RTA) using halogen a lamp for different times to get a homogeneous structure of ZnSe thin films. The films were found to be p-type in nature. The band gap was found to vary with annealing time due to removal of defects and increase grain size of films. It was also observed by X-ray diffraction (XRD) pattern that the grain size of films increase with annealing time. The lattice constant for cubic structure of these films was found to be a ¼ 5.72 A ° . Rutherford back scattering data also confirmed mixing of the elements with annealing time. Published by Elsevier B.V.
  • Keywords
    Inter-diffusion , annealing , thermoelectric power , Semiconductor , RBS , optical band gap , XRD
  • Journal title
    Applied Surface Science
  • Serial Year
    2005
  • Journal title
    Applied Surface Science
  • Record number

    1000506