Pattern formation induced by Ar+ sputtering on Au(1 1 1)

Ion sputtering is employed to produce structures on the nanometer scale. The surface morphology of Au(1 1 1) after sputtering with 500 eV Ar+ ions at various sputtering temperatures (from room temperature (RT) to 150 8C with variation of 25 8C) has been investigated by scanning tunneling microscopy (STM). It is shown that the sputtering temperature can be used to determine the final surface morphology. At all sputtering temperatures, the surface is characterized by random distribution of pits. The shape and size are briefly discussed. The obtained surface morphology is explained with diffusion processes at various sputtering temperatures. The final surface morphology is the result of the diffusion processes.