Title of article :
Growth and characterization of Zn1 xCdxO films
using remote plasma MOCVD
Author/Authors :
Junji Ishihara، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Abstract :
Zn1 xCdxO films were successfully grown by remote plasma enhanced metalorganic chemical vapor deposition (RPEMOCVD)
with diethyl zinc, dimethyl cadmium, and oxygen plasma. The Cd composition x in the Zn1 xCdxO films was tuned by
changing a flow rate of group-II sources. With increasing the Cd composition x, the crystal structure was changed from wurzite
(WZ) to rock-salt (RS). The optical band-gap of the Zn1 xCdxO films with the wurzite structure up to x 0.7 varied from 3.3 eV
down to 1.9 eV.
Keywords :
Remote plasma enhanced metalorganic chemical vapor deposition , Zn1 xCdxO , Dimethyl cadmium , Diethyl zinc
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science