Title of article :
High-reflectance 193 nm Al2O3/MgF2 mirrors
Author/Authors :
Shang Shuzhen*، نويسنده , , Shao Jianda، نويسنده , , Liao Chunyan، نويسنده , , Yi Kui، نويسنده , , Fan Zhengxiu، نويسنده , , Yu-Chen Lei، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
5
From page :
157
To page :
161
Abstract :
Thin-film single layers of Al2O3 and MgF2 were deposited upon super polished fused-silica by electron-beam evaporation. The subsequent optical constants n and k were reported for the spectral range of 180–230 nm. High-reflectance dense multilayer coatings for 193 nm were designed on the basis of the evaluated optical constants and produced. The spectra of the reflectance of HR coatings were compared to the theoretical calculations. HR mirrors of 27 layers with a reflectance of more than 98% were reported.
Keywords :
Optical coatings , HR mirrors , 193 nm , Al2O3 , MgF2
Journal title :
Applied Surface Science
Serial Year :
2005
Journal title :
Applied Surface Science
Record number :
1001288
Link To Document :
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