Title of article :
Synthesis and field emission properties of aluminum nitride nanocones
Author/Authors :
Chun Liu، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
5
From page :
220
To page :
224
Abstract :
One-dimensional aluminum nitride nanostructures have displayed superior field emission due to the combination of small or negative electron affinity and one-dimensional quantum confinement effect. Herein we report on the synthesis of quasi-aligned AlN nanocones via chemical vapor deposition on the Ni-coated silicon wafer at 750 8C through the reaction between AlCl3 vapor and NH3/N2 gas. The as-prepared hexagonal AlN nanocones grow preferentially along c-axis with the tips’ sizes of about 60 nm and the lengths up to several microns. The field emission measurement exhibits a notable electron emission with the apparent turn-on field of 17.8 V/mm, indicating their potential applications as the field emitters. Due to space charge effect, the corresponding Fowler–Nordheim plot shows a two-sectional characteristic with the field enhancement factors of 1450 and 340 at low and high electric fields, respectively
Keywords :
AlN nanocones , Chemical vapor deposition , Space charge effect , Two-sectional Fowler–Nordheim plot , Field emission
Journal title :
Applied Surface Science
Serial Year :
2005
Journal title :
Applied Surface Science
Record number :
1001392
Link To Document :
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