Title of article :
Depth profile and interface analysis in the nm-range
Author/Authors :
S. Oswald *، نويسنده , , R. Reiche، نويسنده , , M. Zier، نويسنده , , S. Baunack، نويسنده , , K. Wetzig، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Abstract :
In modern technology, thin films are shrinking more and more to a thickness of few nanometers. Analytical investigations of
such thin films using the traditional sputter depth profiling, sputtering in combination with surface-analytical techniques, have
limitations due to physical effects especially for very thin films. These limitations are pointed out and some alternatives are
discussed. Non-destructive analysis with angle-resolved X-ray photoelectron spectroscopy is demonstrated to be a useful
method for such investigations. Both qualitative and quantitative results can be obtained even for complex layer structures.
Nevertheless, there are also limitations of this method and some alternatives or complementary methods are considered
Keywords :
Surface morphology , Barrier layers , Depth profiling , thin films , Electron spectroscopy , Angle-dependent analysis
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science