Title of article :
Effect of substrate temperature on the growth of ITO thin films
Author/Authors :
M. Nisha، نويسنده , , S. Anusha، نويسنده , , Aldrin Antony، نويسنده , , R. Manoj، نويسنده , , M.K. Jayaraj، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Abstract :
Indium tin oxide (ITO) thin films were deposited onto glass substrates by rf magnetron sputtering of ITO target and the
influence of substrate temperature on the properties of the films were investigated. The structural characteristics showed a
dependence on the oxygen partial pressure during sputtering. Oxygen deficient films showed (4 0 0) plane texturing while
oxygen-incorporated films were preferentially oriented in the [1 1 1] direction. ITO films with low resistivity of
2.05 10 3 V cm were deposited at relatively low substrate temperature (150 8C) which shows highest figure of merit of
2.84 10 3 square/V
Keywords :
transparent conducting oxides , indium tin oxide , RF magnetron sputtering
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
