• Title of article

    Micro-patterning of chemical functionality of anthracene-bis-resorcinol film using focused ion beam

  • Author/Authors

    Hiroyuki Yoshikawa، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2005
  • Pages
    8
  • From page
    2063
  • To page
    2070
  • Abstract
    Anthracene-bis-resorcinol is an interesting molecule as it forms a hydrogen-bonded network when guest molecules with weak polarity are included. Focused ion beam (FIB) was irradiated on a part of its amorphous film with low dose, and the film was exposed to the vapor of guest molecules. From fluorescence and AFM analyses of this film, it was found that no inclusion compound was formed in FIB irradiated area, i.e. FIB irradiation suppresses the ability to form the inclusion compounds. By utilizing this phenomenon, we succeeded in a microfabrication of relief structures consisting of inclusion compounds which has different fluorescence from its surrounding. Morphology, fluorescence, and IR absorption analyses indicated that hydroxyl or resorcin groups are damaged by ion beams, and consequently a formation of hydrogen-bonded networks, which play a role of a lattice caging guest molecules, becomes impossible
  • Keywords
    inclusion compound , Focused ion beam , Fluorescence spectrum , Atomic force microscope , Anthracene-bis-resorcinol
  • Journal title
    Applied Surface Science
  • Serial Year
    2005
  • Journal title
    Applied Surface Science
  • Record number

    1001678