Title of article
Qualitative electroless Ni/Au plating considerations for the solder mask on top of sequential build-up layers
Author/Authors
Sam Siau، نويسنده , , Alfons Vervaet، نويسنده , , Lieven Degrendele، نويسنده , , Johan De Baets، نويسنده , , Andre Van Calster، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2006
Pages
24
From page
2717
To page
2740
Abstract
Advanced printed circuit boards (PCBs) with sequential build-up (SBU) layers require alternating dielectric and copper
layers on top of a core substrate. This can be achieved by lamination of resin coated copper (RCC) or by coating of dielectric
polymers followed by copper deposition. The plating of electroless Ni/Au used as a solderability preservative on top of
sequential build-up layers is investigated. For this application a solder mask polymer has to be applied in order to separate solder
pads. Experiments showed that on parts of the underlying build-up layer exposed to the electroless Ni plating solution electroless
Ni can grow. This overplating is caused by the remains of colloidal Pd/Sn catalyst on top of the build-up layer from preceding
electroless Cu deposition. At very small features skipping of the plating can also take place. The overplating and skipping
phenomena are influenced by a number of parameters, such as the temperature, the concentration of the stabilizer and pH. The
dimensions of features on the board and the thickness of the solder-mask polymer also influence skipping. Based on qualitative
analyses of the skipping and overplating phenomena rules of thumb for the solder mask design based on the plating conditions
are proposed.
Keywords
Build-up layer , Solder mask , Electroless Ni plating
Journal title
Applied Surface Science
Serial Year
2006
Journal title
Applied Surface Science
Record number
1001767
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