Title of article
Surface analysis for LiBq4 growing on ITO and CuPc film using atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS)
Author/Authors
Ou Gu-ping، نويسنده , , Gui Wen-ming، نويسنده , , Jin Shi-chao، نويسنده , , Zhang Fu-jia *، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2006
Pages
11
From page
3417
To page
3427
Abstract
We have investigated the morphology and surface electron states of LiBq4 deposited on ITO and CuPc/ITO, using atomic
force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). The AFM observations indicate that LiBq4 can form a
much more uniform film on CuPc than that on ITO. Furthermore, X-ray photoelectron spectroscopy (XPS) is utilized to further
demonstrate the AFM results. From the analysis of XPS, we found that LiBq4 molecules have poor thermal stability, they are
seriously oxidized during depositing; but when a CuPc layer is inserted between LiBq4 and ITO film, the oxidation and surface
contamination of LiBq4 are significantly reduced. It is then concluded that the introduction of a CuPc buffer layer under the
LiBq4 film can improve the film quality of LiBq4.The XPS results also testified the fact that no coordination bonds between N
atoms and B atoms are formed in LiBq4 molecules, which make LiBq4 to be potential blue organic light-emitting material
Keywords
Atomic force microscopy (AFM) , X-ray photoelectron spectroscopy (XPS) , Electron affinity
Journal title
Applied Surface Science
Serial Year
2006
Journal title
Applied Surface Science
Record number
1001862
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