Title of article
Pulsed laser deposition process of PLZT thin films using an infrared Nd:YAG laser
Author/Authors
T. Garc?´a، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2006
Pages
6
From page
3783
To page
3788
Abstract
Pulsed laser depositions of PLZT thin films were performed using an Nd:YAG (1064 nm) laser. The growths took place in
vacuum or in an oxygen background. Room temperature and 500 8C were the used substrate temperatures. The X-ray diffraction
analysis revealed a preferential crystallographic orientation in the films grown at room temperature in vacuum. Such result is
discussed. The velocity distribution functions of the species in the plasma plume were obtained from a time of flight study using
optical emission spectroscopy. The maximums of these distributions functions fall around 106 cm/s, equivalent to an energy
range of 18–344 eV. Ionic species of heavy elements (like lead) achieved higher velocities than other lighter species. This result
is linked to the creation of an accelerating spatial charge and to the thermal nature of the target material extraction that allows
some elements to be released first than others. Chemical state variations of the elements present in the films were analyzed.
Under these different growing conditions, lead chemical states varied the most
Keywords
Laser ablation , PLD , PLZT , Texture , thin films , XPS
Journal title
Applied Surface Science
Serial Year
2006
Journal title
Applied Surface Science
Record number
1001909
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