Title of article :
Pulsed laser deposition process of PLZT thin films using an infrared Nd:YAG laser
Author/Authors :
T. Garc?´a، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Pages :
6
From page :
3783
To page :
3788
Abstract :
Pulsed laser depositions of PLZT thin films were performed using an Nd:YAG (1064 nm) laser. The growths took place in vacuum or in an oxygen background. Room temperature and 500 8C were the used substrate temperatures. The X-ray diffraction analysis revealed a preferential crystallographic orientation in the films grown at room temperature in vacuum. Such result is discussed. The velocity distribution functions of the species in the plasma plume were obtained from a time of flight study using optical emission spectroscopy. The maximums of these distributions functions fall around 106 cm/s, equivalent to an energy range of 18–344 eV. Ionic species of heavy elements (like lead) achieved higher velocities than other lighter species. This result is linked to the creation of an accelerating spatial charge and to the thermal nature of the target material extraction that allows some elements to be released first than others. Chemical state variations of the elements present in the films were analyzed. Under these different growing conditions, lead chemical states varied the most
Keywords :
Laser ablation , PLD , PLZT , Texture , thin films , XPS
Journal title :
Applied Surface Science
Serial Year :
2006
Journal title :
Applied Surface Science
Record number :
1001909
Link To Document :
بازگشت