Title of article :
Improvement of photoluminescence properties of porous silicon by silica passivation
Author/Authors :
Xi-Wen Du *، نويسنده , , Ying-Wei Lu، نويسنده , , Jun-Peng Liu، نويسنده , , Jing Sun، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Pages :
6
From page :
4161
To page :
4166
Abstract :
Porous silicon (PS) was passivated by silica film using a sol–gel method; the photoluminescence (PL) properties were significantly improved; namely, PL intensity and stability increased and PL peak shifted to shorter wavelength. Scanning electron microscope (SEM) and Fourier transformed infrared spectroscope (FTIR) results indicated that silica passivation produced a compact film on the PS surface and modified the surface state of PS. The number of stable surface bonds (HSi–O3, HSi–SiO2 and H2Si–O2) increased due to the oxidation of Si–H back-bonds during the gelation process, and thus the PL intensity and stability were improved. Moreover, the blue-shift of PL peak was determined due to the increase in the ratio of Si–O/Si–H.
Keywords :
Silicon oxide , Anodic oxidation , Fourier transform infrared spectroscopy (FTIR) , Optical properties
Journal title :
Applied Surface Science
Serial Year :
2006
Journal title :
Applied Surface Science
Record number :
1001965
Link To Document :
بازگشت