Title of article :
Improvement of photoluminescence properties of
porous silicon by silica passivation
Author/Authors :
Xi-Wen Du *، نويسنده , , Ying-Wei Lu، نويسنده , , Jun-Peng Liu، نويسنده , , Jing Sun، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Abstract :
Porous silicon (PS) was passivated by silica film using a sol–gel method; the photoluminescence (PL) properties were
significantly improved; namely, PL intensity and stability increased and PL peak shifted to shorter wavelength. Scanning
electron microscope (SEM) and Fourier transformed infrared spectroscope (FTIR) results indicated that silica passivation
produced a compact film on the PS surface and modified the surface state of PS. The number of stable surface bonds (HSi–O3,
HSi–SiO2 and H2Si–O2) increased due to the oxidation of Si–H back-bonds during the gelation process, and thus the PL intensity
and stability were improved. Moreover, the blue-shift of PL peak was determined due to the increase in the ratio of Si–O/Si–H.
Keywords :
Silicon oxide , Anodic oxidation , Fourier transform infrared spectroscopy (FTIR) , Optical properties
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science