Title of article :
High resolution hard X-ray photoemission using synchrotron radiation
as an essential tool for characterization of thin solid films
Author/Authors :
J.J. Kim، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Abstract :
Recently, we have shown that hard X-ray photoemission spectroscopy using undulator X-rays at SPring-8 is quite feasible with both high
resolution and high throughput. Here we report an application of hard X-ray photoemission spectroscopy to the characterization of electronic and
chemical states of thin solid films, for which conventional PES is not applicable. As a typical example, we focus on the problem of the scatter in the
reported band-gap values for InN.We show that oxygen incorporation into the InN film strongly modifies the valence and plays a crucial role in the
band gap problem. The present results demonstrate the powerful applicability of high resolution photoemission spectroscopy with hard X-rays
from a synchrotron source.
Keywords :
Oxygen incorporation , InN , High resolution hard X-ray photoemission spectroscopy
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science