Title of article :
Effect of ion nitriding on the crystal structure of 3 mol%
Y2O3-doped ZrO2 thin-films prepared by the sol–gel method
Author/Authors :
A.L. Ortiz *، نويسنده , , A. D?´az-Parralejo، نويسنده , , O. Borrero-Lo´pez، نويسنده , , F. Guiberteau، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Abstract :
We investigated the effect of ion nitriding on the crystal structure of 3 mol% Y2O3-doped ZrO2 (3YSZ) thin-films prepared by the sol–gel
method. For this purpose, we used X-ray diffractometry to determine the crystalline phases, the lattice parameters, the crystal sizes, and the lattice
microstrains, and glow discharge–optical emission spectroscopy to obtain the depth profiles of the elemental chemical composition.We found that
nitrogen atoms substitute oxygen atoms in the 3YSZ crystal, thus leading to the formation of unsaturated-substitutional solid solutions with
reduced lattice parameters and Zr0.94Y0.06O1.72N0.17 stoichiometric formula.We also found that ion nitriding does not affect the grain size, but does
generate lattice microstrains due to the increase in point defects in the crystalline lattice
Keywords :
Sol–gel , crystal structure , Zirconia thin-films , Ion nitriding , X-ray diffractometry
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science