Title of article :
Chemical effects in C60 irradiation of polymers
Author/Authors :
R. Mo¨llers، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Abstract :
The C60 erosion behaviour of poly(methyl)methacrylate (PMMA), poly(a-methyl)styrene (PAMS) and polystyrene (PS) has been studied at
various temperatures and compared with that under Ga+ irradiation. Strong variations of erosion yields are observed, indicating that chemical
degradation mechanisms are operating. In particular, our results suggest that fast depolymerization mechanisms are important in leaving the
surface of the sputter crater virtually undamaged. Since such mechanisms are connected with the chemical nature of the polymer, the possibility of
performing molecular depth profiling of polymers with C60 appears to depend strongly on the chemical nature of the system under study.
Keywords :
Cluster SIMS , Fullerene ion beam , Depth profiling , Polymers , radiation damage , TOF-SIMS
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science