• Title of article

    Sputtering yields of PMMA films bombarded by keV C60 + ions

  • Author/Authors

    I.L. Bolotin، نويسنده , , S.H. Tetzler، نويسنده , , L. Hanley *، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2006
  • Pages
    4
  • From page
    6533
  • To page
    6536
  • Abstract
    A quartz crystal microbalance (QCM) has been used to determine total-mass sputtering yields of PMMA films by 1–16 keV C60 +,2+ ion beams. Quantitative sputtering yields for PMMA are presented as mass loss per incident ion Ym. Mass-lost rate QCM data show that a 13 keV C60 cluster leads to emission equivalent to 800 PMMA molecules per ion. The power law obtained for the increase in sputtering yield with primary ion energy is in good agreement those predicted by ‘‘thermal spike’’ regime and MD models, when crater sizes are used to estimate sputtering.
  • Keywords
    sputtering yield , Polymers , PMMA , Cluster , C60 , secondary ion mass spectrometry
  • Journal title
    Applied Surface Science
  • Serial Year
    2006
  • Journal title
    Applied Surface Science
  • Record number

    1002376