Title of article
End group effect on surface and interfacial segregation in PS-PMMA blend thin films
Author/Authors
L. Kailas، نويسنده , , P. Bertrand *، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2006
Pages
4
From page
6648
To page
6651
Abstract
Thin films of polystyrene (PS)/poly (methyl methacrylate) (PMMA) blends with different end groups were investigated using ToF-SIMS and
AFM. PS with -OH and -NH2 end groups were blended in toluene solvent with pure PMMA homopolymer, and PMMA having anhydride end
group. The ToF-SIMS spectra of PS-OH/PMMA resembled that of pure PS–PMMA blends showing an increase of PMMA intensity after
annealing. On the contrary, the PS-NH2 blended with PMMA showed an increase in PS intensity on the surface after annealing. The ToF-SIMS
spectra were similar to that of a pure PS–PMMA di-block copolymer. These results indicate copolymer formation at the surface. The PS-NH2 with
PMMA-anhydride blend spectra showed very slight changes in spectra before and after annealing and the AFM images revealed spinodal bicontinuous
structures on the surface before and after annealing. The copolymer formation is found to occur in the as-cast film itself and not after
thermal treatment.
Keywords
TOF-SIMS , AFM , blends , thin films , Copolymer , End groups
Journal title
Applied Surface Science
Serial Year
2006
Journal title
Applied Surface Science
Record number
1002403
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