Abstract :
The increasing use of Ultraviolet (UV) light in medicine, industrial environments, for cosmetic use, and even in consumer products necessitates
that greater attention be paid to the potential hazards of this type of electromagnetic radiation. To avoid any adverse effects of exposure to this type
of radiation, four suitable protection filters were produced to block three UV bands (UVA, UVB, and UVC). The design structure of the required
dielectric multilayer filters was done by optical thin film technology using the absorbing property of UV radiation for the substrates and dielectric
materials. The computer analyses of the multilayer filter formulas were prepared using Macleod Software for the production processes. The
deposition technique was achieved on optical substrates (Glass BK-7 and Infrasil 301) by dielectric material combinations including Titanium
dioxide (Ti2O3), Hafnium dioxide (HfO2), and Lima (mixture of oxides SiO2/Al2O3); deposition being achieved using an electron beam gun. The
output results of the theoretical and experimental transmittance values for spectral band from 200 nm to 800 nm were discussed in four processes.
To analyze the suitability for use in ‘real world’ applications, the test pieces were subjected to the durability tests (adhesion, abrasion resistance,
and humidity) according to Military Standard MIL-C-675C and MIL-C-48497A.
