Title of article :
Microstructure effect on microtopography of chemically etched a + b Ti alloys
Author/Authors :
P.Y. Lim، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Pages :
10
From page :
449
To page :
458
Abstract :
Microstructure effect on chemical etching behavior of the annealed Ti–6Al–4Vand Ti–3Al–2.5V titanium (Ti) alloys was compared with that of unalloyed commercially pure titanium. The microstructural evolution of structure phases after annealing the titanium and its alloys at temperature near and above b transus and followed by furnace cooling to room temperature was studied using optical microscope, scanning electron microscope and X-ray diffraction techniques. The microstructure study illustrates that the heat treatment enhanced partitioning effect allows extensive formation of hemispherical and near spherical pits roughened surface to be readily acquired by chemically etching the annealed a + b titanium alloys. The kinetics of the chemical etching reaction process show a linear dependence on time. The annealed a + b titanium alloys that exhibit relatively lower weight loss and thickness reduction rate illustrate less chemical activity than the annealed unalloyed titanium.
Keywords :
profilometry , SEM , Roughness , immersion test , Chemical etching , Titanium
Journal title :
Applied Surface Science
Serial Year :
2006
Journal title :
Applied Surface Science
Record number :
1002872
Link To Document :
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