Title of article :
Anisotropic diffusion of Cu adatoms on strained Cu (1 1 1) surface
Author/Authors :
Y.X. Wang، نويسنده , , Z.Y. Pan، نويسنده , , T.J. Liu، نويسنده , , X.M. Jiang، نويسنده , , L. Zhou، نويسنده , , J. Zhu، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Abstract :
Diffusion of Cu atoms on a strained Cu (1 1 1) surface was studied by molecular dynamic simulation using an EAM potential. The anisotropic
diffusion behaviour is found when the uniaxial strain is imposed on the surface, which does not exist under the biaxial strain. The migration of the
adatom is suppressed along the tensile strain direction. The results suggest that different island morphology can be obtained by controlling
anisotropic diffusion of adatoms on the strained surfaces during film growth.
Keywords :
Diffusion of adatoms , Strained Cu (1 1 1) surface , Thin film growth , Molecular dynamic simulation
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science