Abstract :
The surfaces of three kinds of copolymerized polyimide films were irradiated by ultraviolet (UV) light. The chemical composition changes of
the films after irradiation were investigated by X-ray photoelectron spectroscopy (XPS), while their topographical changes were studied by atomic
force microscopy (AFM). Besides, the surface topographical variation induced changes in friction behavior were recorded on a DF PM
unidirectional friction and wear test rig in a ball on block contact configuration. It was found that photodegradation took place, which induced the
chain scission of the polyimide molecules and formation of low molecular weight oxidized material (LMWOM). Due to different photostability of
the three kinds of polyimide, different chemical composition changes and forms of ‘‘LMWOM’’ were observed. Also, different friction behavior
variations of the three kinds of polyimide films were recorded. It is thought that the polyimide film of PI (PPA + PMDA) with rod-like structures
might have stronger photo-resistance, whose form of ‘‘LMWOM’’ was ‘‘nodules’’ and whose friction coefficient increased at 2 h of irradiation
possibly due to cross-linking. In the case of PI (OPA + PMDA) and PI (MPA + PMDA) films, they mainly underwent photodegradation, which
might soften the surfaces and increased the friction coefficients with increasing irradiation time.
Keywords :
X-ray photoelectron spectroscopy , Atomic force microscopy , Friction behavior , Surface topography , Photochemistry , Polyimide film