Title of article
Effect of film thickness on interface and electric properties of BiFeO3 thin films
Author/Authors
Chia-Ching Lee، نويسنده , , Jenn-Ming Wu، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2007
Pages
5
From page
7069
To page
7073
Abstract
Bismuth ferrite (BFO) thin films were fabricated by RF-magnetron sputtering deposition method on Pt/Ti/SiO2/Si(1 0 0) substrate. The effect of
the thickness of BFO films varying from 85 to 280 nm on electrical properties was investigated. Saturated coercive fields were found to increase
with the BFO film thickness. The dielectric constant of BFO thin films measured at 1 kHz decreased with decreasing thickness from 98 to 86, while
tangent losses increased from 0.013 to 0.021. The presence of bismuth oxide at the interface between BFO films and Pt bottom electrodes was
responsible for the high leakage currents in thin BFO thin films as was demonstrated by X-ray diffraction, grazing-incident X-ray diffraction, and
secondary ion mass spectroscopy analysis.
Keywords
ferroelectric , Film thickness , Bismuth ferrite , Thin film
Journal title
Applied Surface Science
Serial Year
2007
Journal title
Applied Surface Science
Record number
1003942
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