Abstract :
We demonstrate how growth processes affect on ZnO film properties, which are to be essential guides to prevent defect formation in order to
synthesize reproducible high quality ZnO films. First, we reveal that deposition at a low temperature is indispensable to transfer underlying GaN
atomic terraces to ZnO surface. As the film thickness is increased, however, the terraces disappear to develop island morphology. It is found that the
thick film surface is smoothed to the extent that atomic terraces can be seen after an appropriate thermal treatment. Adverse effects associated with
high annealing temperatures are then demonstrated as evidenced by cracks formation, increased yellow cathode-luminescence and intermixing at
the interface
Keywords :
Zinc oxide , Pulsed-laser deposition , Gallium nitride , annealing