The fabrication and photoresponse of ZnO/diamond film heterojunction diode

Boron-doped p-type freestanding diamond (FSD) films were prepared by hot filament chemical vapor deposition (HFCVD) method. The effect of B/C ratio on the electrical properties of FSD films was investigated by Hall effect measurement system. A ZnO/diamond heterojunction diode was fabricated successfully by depositing n-type ZnO films on the p-type FSD substrate by radio-frequency (RF) magnetron sputtering method. The wavelength dependent photoresponse properties of the heterojunction diode were investigated by studying the effect of light illumination on current–voltage (I–V) characteristics and photocurrent spectra at room temperature. The diode showed a significant discrimination between ultraviolet (UV) and the visible light under reverse bias conditions and photoresponse of the device was approximately linear related to the increasing reverse bias voltages.