Author/Authors :
Yoon-Hyun Kim، نويسنده , , Myung-Geun Jeong، نويسنده , , Hyun Ook Seo، نويسنده , , Seong Yong Park، نويسنده , , In-Bum Jeong، نويسنده , , Kwang-Dae Kim، نويسنده , , Sung Min Cho، نويسنده , , DONG CHAN LIM، نويسنده , , Young Dok Kim، نويسنده ,
Abstract :
Very thin polydimethylsiloxane (PDMS)-layer with a mean thickness of 3–5 nm was formed on Cu particles by using thermal evaporation of PDMS at 200 °C under nitrogen atmosphere. Using X-ray photoelectron spectroscopy and FT-IR, it was shown that the dimethylsiloxane framework was sustained after evaporation of PDMS and its deposition on Cu particles. Initiation temperature for oxidation of Cu was shifted to a higher temperature by more than 50 °C in the presence of PDMS-layer, indicating that PDMS can be used as protection layer of metal particles in various applications.
Keywords :
Oxidation , Metal , Protection , PDMS
