Title of article :
Thin films deposited by femtosecond pulsed laser ablation of tungsten carbide
Author/Authors :
A. De Bonis، نويسنده , , R. Teghil، نويسنده , , A. Santagata، نويسنده , , A. Galasso، نويسنده , , J.V. Rau، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2012
Pages :
4
From page :
9198
To page :
9201
Abstract :
Ultra-short Pulsed Laser Deposition has been applied to the production of thin films from a tungsten carbide target. The gaseous phase obtained by the laser ablation shows a very weak primary plume, in contrast with a very strong secondary one. The deposited films, investigated by Scanning Electron Microscopy, Atomic Force Microscopy, X-Ray Photoelectron Spectroscopy and X-Ray Diffraction, present a mixture of WC and other phases with lower carbon content. All films are amorphous, independently from the substrate temperature. The characteristics of the deposits have been explained in terms of thermal evaporation and cooling rate of molten particles ejected from the target.
Keywords :
Tungsten carbide , Ultra-short pulse laser , Nanoparticles , Pulsed laser deposition
Journal title :
Applied Surface Science
Serial Year :
2012
Journal title :
Applied Surface Science
Record number :
1005540
Link To Document :
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