Grid-pattern formation of extracellular matrix on silicon by low-temperature atmospheric-pressure plasma jets for neural network biochip fabrication

Grid patterns of extracellular matrices (ECMs) have been formed on silicon (Si) substrates with the use of low-temperature atmospheric-pressure plasma (APP) jets with metal stencil masks and neuron model cells have been successfully cultured on the patterned ECMs. Arrangement of living neuron cells on a microelectronics chip in a desired pattern is one of the major challenges for the fabrication of neuron-cell biochips. The APP-based technique presented in this study offers a cost-effective solution to this problem by providing a simple patterning method of ECMs, which act as biological interfaces between living cells and non-biological materials such as Si.