Title of article
A Monte Carlo simulation model for surface evolution by plasma etching
Author/Authors
Fangfang Chen، نويسنده , , Kaigui Zhu a، نويسنده , , Aqing Chen a، نويسنده , , Weijie Huang، نويسنده , , Lishuang Feng، نويسنده , , Zhen Zhou، نويسنده , , Guanglu Ge، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2013
Pages
5
From page
655
To page
659
Abstract
A Monte Carlo simulation model, i.e. sputtering etch model, was established with Monte Carlo method to simulate plasma etching induced surface morphology evolution. The surface morphology images and fractal exponents were obtained, with α = 0.5, β = 0.27, z = 1.76. Germanium samples were etched in SF6 plasma and the post-etch surface was analyzed in order to compare with the model. The surface morphology images and fractal exponents by simulation describe the experimental results very well.
Keywords
Plasma etching , simulation , Monte Carlo method , Surface morphology
Journal title
Applied Surface Science
Serial Year
2013
Journal title
Applied Surface Science
Record number
1007562
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