Title of article
Visible-light photocatalytic activity of nitrogen-doped TiO2 thin film prepared by pulsed laser deposition
Author/Authors
Lei Zhao ، نويسنده , , Qing Jiang، نويسنده , , Jianshe Lian، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2008
Pages
6
From page
4620
To page
4625
Abstract
Nitrogen-doped titanium dioxide (TiO2−xNx) thin films have been prepared by pulse laser deposition on quartz glass substrates by ablated titanium dioxide (rutile) target in nitrogen atmosphere. The x value (nitrogen concentration) is 0.567 as determined by X-ray photoelectron spectroscopy measurements. UV–vis spectroscopy measurements revealed two characteristic deep levels located at 1.0 and 2.5 eV below the conduction band. The 1.0 eV level is attributable to the O vacancy state and the 2.5 eV level is introduced by N doping, which contributes to narrowing the band-gap by mixing with the O2p valence band. The enhanced degradation efficiency in a broad visible-light range was observed from the degradation of methylene blue and methylene orange by the TiO2−xNx film.
Keywords
TiO2 thin film , Nitrogen-doped , Visible-light photocatalytic activity , Pulsed laser deposition
Journal title
Applied Surface Science
Serial Year
2008
Journal title
Applied Surface Science
Record number
1009210
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