Title of article :
Surface characteristics of Ni catalystic films on growth behavior of multi-walled carbon nanotubes
Author/Authors :
Hoon-Sik Jang، نويسنده , , Sung-Oong Kang، نويسنده , , Seung-Hoon Nahm، نويسنده , , Bae Ho Park، نويسنده , , Yong-Il Kim، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2008
Pages :
6
From page :
4644
To page :
4649
Abstract :
The effect of the surface characteristics of Ni catalyst films on the growth behavior of multi-walled carbon nanotubes (MWCNTs) were investigated using Ni catalyst films prepared by different physical vapor deposition methods, electron-beam evaporation and sputtering. The growth behavior of MWCNTs was dependent upon the surface roughness of the Ni films. After a pretreatment process with NH3, the root mean squares of surface roughness of e-beam evaporated and sputtered Ni catalyst films increased to 16.6 and 3.2 nm, respectively. Curled-MWCNTs and carbon-encapsulated Ni nanoparticles were formed on the Ni film deposited by e-beam evaporation while vertically aligned-MWCNTs were grown on the sputter-deposited film. In addition, the surface roughness of the Ni films affected the field emission properties of the MWCNTs. This was considered to originate from the specific growth behavior of the MWCNTs which was primarily caused by the initial surface roughness of the Ni films.
Keywords :
Catalyst metal , Growth behavior , Carbon nanotubes
Journal title :
Applied Surface Science
Serial Year :
2008
Journal title :
Applied Surface Science
Record number :
1009214
Link To Document :
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