Title of article
Effect of oxygen partial pressure on PLD cobalt oxide films
Author/Authors
S. Laureti، نويسنده , , E. Agostinelli، نويسنده , , G. Scavia، نويسنده , , G. Varvaro، نويسنده , , V. Rossi Albertini، نويسنده , , A. Generosi، نويسنده , , B. Paci، نويسنده , , A. Mezzi، نويسنده , , S. Kaciulis، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2008
Pages
5
From page
5111
To page
5115
Abstract
Thin CoO oxide layers with superior properties in terms of crystallographic ordering, surface roughness and constant and controlled chemical compositions have been prepared by pulsed laser deposition in reactive O2 atmosphere at 400 °C. Such systems are particularly suitable both for applications and for basic studies, any time high quality and controlled surfaces are required, for example in multilayered systems whose behaviour critically depends on interface properties, such as magnetically exchange-coupled systems. A structural and microstructural study of such films is presented, together with the compositional analysis for different process conditions. The best control on film stoichiometry was obtained by protecting the surface with a thin Pt cap-layer, before air exposure.
Keywords
Cobalt oxide , Thin film growth , pulsed laser deposition
Journal title
Applied Surface Science
Serial Year
2008
Journal title
Applied Surface Science
Record number
1009287
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