Title of article
Characterization of soft-X-ray detectors fabricated with high-quality CVD diamond thin films
Author/Authors
Y. Iwakaji، نويسنده , , M. Kanasugi، نويسنده , , O. Maida، نويسنده , , Y. Takeda، نويسنده , , Y. Saitoh، نويسنده , , T. Ito، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2008
Pages
4
From page
6277
To page
6280
Abstract
We have characterized the performance of soft-X-ray detectors fabricated with undoped and B-doped homoepitaxial diamond layers of high quality which were grown on a commercially available type Ib (1 0 0) substrate by means of a high-power microwave-plasma chemical-vapor-deposition (CVD) method. The signal currents of the diamond-based detectors with thin TiN electrodes formed vertically (along the homoepitaxial growth direction) were measured at room temperature as a function of the applied voltage, Va, for irradiations of 500–1200 eV soft-X-ray beams ranging from ≈6 × 109 to ≈1 × 1011 photons/s. The deduced apparent quantum efficiencies increased with the increasing Va and reached to 2.5 × 103 at Va = 60 V. As expected from the device structure, the detector performance depended only very slightly on the applied magnetic field up to 10 T. The excellently high sensitivities attained for soft-X-ray photons are discussed in relation to carrier amplification mechanisms which invested the above diamond detectors.
Keywords
Diamond film , Plasma CVD , Detectors , Electrical properties characterization
Journal title
Applied Surface Science
Serial Year
2008
Journal title
Applied Surface Science
Record number
1009507
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