Title of article
Quantum chemical molecular dynamical investigation of alkyl nitrite photo-dissociated on copper surfaces
Author/Authors
Xiaojing Wang، نويسنده , , Wei Wang، نويسنده , , Peilin Han، نويسنده , , Momoji Kubo ، نويسنده , , Akira Miyamoto ، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2008
Pages
9
From page
6991
To page
6999
Abstract
An accelerated quantum chemical molecular dynamical code “Colors-Excite” was used to investigate the photolysis of alkyl nitrites series, RONO (Rdouble bond; length as m-dashCH3 and C(CH3)3) on copper surfaces. Our calculations showed that the photo-dissociated processes are associated with the alkyl substituents of RONO when adsorbed on copper surfaces. For Rdouble bond; length as m-dashCH3, a two-step photolysis reaction occurred, yielding diverse intermediate products including RO radical, NO, and HNO, consistent with those reported in gas phase. While for Rdouble bond; length as m-dashC(CH3)3, only one-step photolysis reaction occurred and gave intermediate products of RO radical and NO. Consequently, pure RO species were achieved to adsorb on metal surfaces by removing the NO species in photolysis reaction. The detailed photo-dissociated behaviors of RONO on copper surfaces with different alkyl substituents which are uncovered by the present simulation can be extended to explain the diverse dissociative mechanism experimentally observed. The quantum chemical molecular dynamical code “Colors-Excite” is proved to be highly applicable to the photo-dissociations on metal surfaces.
Keywords
Copper surface , Alkyl nitrites , Quantum chemical molecular dynamics , Colors-Excite , Photolysis
Journal title
Applied Surface Science
Serial Year
2008
Journal title
Applied Surface Science
Record number
1009642
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