Title of article
Investigations of semiconductor devices using SIMS; diffusion, contamination, process control
Author/Authors
Jae Cheol Lee، نويسنده , , Jeongyeon Won، نويسنده , , Youngsu Chung، نويسنده , , Hyungik Lee، نويسنده , , Eunha Lee، نويسنده , , Donghun Kang، نويسنده , , Changjung Kim، نويسنده , , Jinhak Choi، نويسنده , , Jeomsik Kim، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2008
Pages
5
From page
1395
To page
1399
Abstract
We have surveyed 22,155 analyses issues to know the portion of surface analysis at the total analyses activities. According to the survey result, the contribution of SIMS in the total analyses issues was about 7%. The portions of semiconductor process control, composition and contamination in the SIMS analyses issues are 25%, 29% and 16%, respectively. In this article, some examples of the semiconductor device process control, identification of contaminants, and failure analyses have been reviewed. The behavior of H, O, and Ti at the Pt/Ti/GaInZnO interfaces and their influences on the electrical property of thin film transistor are demonstrated. Also discolor issues including organic material contamination problem on Au pad are discussed in detail.
Keywords
SIMS , Diffusion , Process control , contamination
Journal title
Applied Surface Science
Serial Year
2008
Journal title
Applied Surface Science
Record number
1009838
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