Title of article
A transmission electron microscopy study on the crystal structure and atomic arrangement of Al–Nd thin films deposited on glass substrates
Author/Authors
Yu Jin Park، نويسنده , , Hyuk Nyun Kim، نويسنده , , Hyun Ho Shin، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2008
Pages
5
From page
2104
To page
2108
Abstract
The crystal structure and atomic arrangement of Al–2 at.% Nd thin films were investigated by a transmission electron microscopy (TEM) study. As a result, we have revealed that Nd atoms exist in Al matrix as solid solutions in the state of as-deposited and annealed at low temperature, while the intermetallic compounds with the composition of Al4Nd are precipitated as the annealing temperature increased above 300 °C. The precipitated Al4Nd has a tetragonal structure with nine cyclic layers, and the atomic arrangement was identified by the fast Fourier transform (FFT) and Fourier filtered images as well as the experimental high-resolution transmission electron microscopy (HRTEM) images. Consequently, Nd atoms, forms of solid solutions or precipitates, effectively suppress the grain growth of Al.
Keywords
Transmission electron microscopy , Al4Nd , Atomic arrangement , Grain growth
Journal title
Applied Surface Science
Serial Year
2008
Journal title
Applied Surface Science
Record number
1009981
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