Title of article :
Extremely low-energy projectiles for SIMS using size-selected gas cluster ions
Author/Authors :
Kousuke Moritani، نويسنده , , Michihiro Hashinokuchi، نويسنده , , Jun Nakagawa، نويسنده , , Takahiro Kashiwagi، نويسنده , , Noriaki Toyoda، نويسنده , , Kozo Mochiji، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2008
Pages :
3
From page :
948
To page :
950
Abstract :
A new cluster time-of-flight secondary ion mass spectrometry (TOF-SIMS) was developed using a size-selected gas cluster ion as a projectile. Since a large gas cluster ion can generate many low-energy constituent atoms in a collision with the surface, it causes multiple and ultra low-energy sputtering. The mean kinetic energy of constituent atoms is provided by dividing the acceleration energy of the gas cluster ion by the number of constituent atoms. Therefore, the sputtering can be controlled to minimize the decomposition of sample molecules and substrate material by precisely adjusting the number of constituent atoms (the cluster size) and/or acceleration energy of the gas cluster ion. The cluster size was selected on the basis of the time-of-flight method using two ion deflectors attached along the ion-beam line. A high resolution of 11.7 was achieved for the cluster size/size width (M/ΔM) of Ar-cluster ions.
Keywords :
Non-linear effect , Sputtering , cluster size , Gas cluster ion beam , TOF-SIMS
Journal title :
Applied Surface Science
Serial Year :
2008
Journal title :
Applied Surface Science
Record number :
1010406
Link To Document :
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