Title of article
The effect of C60 cluster ion beam bombardment in sputter depth profiling of organic–inorganic hybrid multiple thin films
Author/Authors
Hyun Kyong Shon، نويسنده , , Tae Geol Lee، نويسنده , , Dahl Hyun Kim، نويسنده , , Hee Jae Kang، نويسنده , , Byoung-Hoon Lee، نويسنده , , Myung Mo Sung، نويسنده , , Dae Won Moon، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2008
Pages
3
From page
1055
To page
1057
Abstract
The effects of C60 cluster ion beam bombardment in sputter depth profiling of inorganic–organic hybrid multiple nm thin films were studied. The dependence of SIMS depth profiles on sputter ion species such as 500 eV Cs+, 10 keV C60+, 20 keV C602+ and 30 keV C603+ was investigated to study the effect of cluster ion bombardment on depth resolution, sputtering yield, damage accumulation, and sampling depth.
Keywords
TOF-SIMS , C60 cluster ion bombardment , Inorganic–organic multiple nm thin films
Journal title
Applied Surface Science
Serial Year
2008
Journal title
Applied Surface Science
Record number
1010434
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