Title of article :
Field emission properties of nitrogen incorporated DLC films prepared by electrodeposition
Author/Authors :
R.S. Li، نويسنده , , E.Q. Xie *، نويسنده , , M. Zhou، نويسنده , , Z.X. Zhang، نويسنده , , T. Wang، نويسنده , , B.A. Lu، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2008
Pages :
4
From page :
2787
To page :
2790
Abstract :
Nitrogen incorporated diamond-like carbon (DLC:N) films with different N content were deposited on Si(1 0 0) substrates by electrolysis of urea/methanol organic solution with different mole ratios under a constant voltage of 600 V. Analysis by Raman spectrometry and X-ray photoelectron spectrometry (XPS) shows that N is incorporated into the DLC films by sp3 C–N and sp2 Cdouble bond; length as m-dashN bonds and induces graphitization of the films. The electronic field emission properties of these films have been studied using a parallel plate configuration, and the dependence on N content investigated. The turn-on field (Ec) is lowered with increasing N content, and there is a simultaneous rise in the field emission current densities under the electric field of 23.5 V/μm. Enhancement in field emission is attributed to the donor activity of nitrogen and the field enhancement effect of sp2 clusters.
Keywords :
Electrodeposition , Field emission , N incorporation , Diamond-like carbon
Journal title :
Applied Surface Science
Serial Year :
2008
Journal title :
Applied Surface Science
Record number :
1010828
Link To Document :
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