Role of plasma activation in tailoring the nanostructure of multifunctional oxides thin films

Potential of O2 remote plasmas for improving structural, morphological and optical properties of various multifunctional oxides thin films both during plasma assisted growth as well as by post-growth treatments is discussed. In particular, an O2 remote plasma metalorganic chemical vapor deposition (RP-MOCVD) route is presented for tailoring the structural, morphological and optical properties of Er2O3 and ZnO films. Furthermore, post-growth room-temperature remote O2 plasma treatments of indium-tin-oxides (ITO) films are demonstrated to be effective in improving morphology of ITO films.