Title of article :
Effect of thermal annealing on nanoimprinted Cu–Ni alloys using molecular dynamics simulation
Author/Authors :
Te-Hua Fang، نويسنده , , Cheng-Da Wu، نويسنده , , Win-Jin Chang، نويسنده , , Sung-Shui Chi، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2009
Pages :
5
From page :
6043
To page :
6047
Abstract :
The mechanical behaviors of nanoimprinted Cu–Ni alloys before and after annealing were studied using molecular dynamics simulation with a tight-binding potential. The results showed that when the punch is advancing, the punching force obtained from the simulation with a tight-binding potential is lower than with the Morse potential. During and after withdrawing the punch from the specimen, the adhesive phenomena are observed and the large residual stress in the Cu–Ni alloys is induced. During the annealing process, the internal energy of Cu–Ni alloys decreased with increasing the temperature and the component of Cu. In addition, comparing the maximum residual stress in the Cu–Ni alloys with and without annealing treatment, the stress is significantly released after annealing, especially in the higher component of Ni.
Keywords :
Thermal annealing , Nanoimprint , molecular dynamics , Residual stress , Cu–Ni alloys
Journal title :
Applied Surface Science
Serial Year :
2009
Journal title :
Applied Surface Science
Record number :
1011425
Link To Document :
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