Title of article
Observation of internal-conversion electrons induced by inelastic nuclear resonant scattering
Author/Authors
Taizo Kawauchi، نويسنده , , Katsuyuki Fukutani، نويسنده , , Tatsuo Okano، نويسنده , , Shunji Kishimoto، نويسنده , , Xiaowei Zhang ، نويسنده , , Yoshitaka Yoda، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2009
Pages
3
From page
962
To page
964
Abstract
Measurements of the internal-conversion electron emission due to the inelastic nuclear resonant excitation are reported. image thin films of 20 and 1.3 nm thickness were deposited on Si(1 1 1), and the internal-conversion electrons were measured as a function of the photon energy. From the inelastic part of the spectra, the phonon density of states was obtained. Whereas the phonon density of states of 20-nm thick film resembles that of bulk image-Fe, the 1.3-nm thick film revealed an obvious softening of the acoustic mode.
Keywords
Nuclear inelastic resonance , Conversion electron
Journal title
Applied Surface Science
Serial Year
2009
Journal title
Applied Surface Science
Record number
1011545
Link To Document