Title of article
In situ monitoring of ZnO formation by photoemission spectroscopy
Author/Authors
Suttinart Noothongkaew، نويسنده , , Ratchadaporn Supruangnet، نويسنده , , Worawat Meevasana، نويسنده , , Hideki Nakajima، نويسنده , , Sukit Limpijumnong، نويسنده , , Prayoon Songsiriritthigul، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2009
Pages
4
From page
980
To page
983
Abstract
Exposure of a clean Zn metal to oxygen in ultra high vacuum provides a mean to gradually form ZnO. With in situ synchrotron photoelectron measurement, the progressive change in the spectra with the oxygen exposure time is observed. The analysis of the spectra allows the determination of ZnO formation. It was found that the oxidation process takes place until reaching the critical thickness, at which the oxidation rate reduces greatly to nearly zero. The critical thickness was determined to be about 2 monolayers.
Keywords
ZnO , Oxidation of Zn , Synchrotron radiation , Photoemission spectroscopy
Journal title
Applied Surface Science
Serial Year
2009
Journal title
Applied Surface Science
Record number
1011550
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