Title of article :
Size-selected Au clusters deposited on SiO2/Si: Stability of clusters under ambient pressure and elevated temperatures
Author/Authors :
DONG CHAN LIM، نويسنده , , Rainer Dietsche، نويسنده , , Gerd Gantef?r، نويسنده , , Young Dok Kim، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2009
Pages :
4
From page :
1148
To page :
1151
Abstract :
This study examined the oxidation and reduction behavior of mass-selected Au clusters consisting of 2–13 atoms deposited on silica. An atomic oxygen environment was used for the oxidation of Au. X-ray photoelectron spectroscopy (XPS) was used to identify Au(III) and Au(O). Au5, Au7 and Au13 clusters deposited on the as-prepared SiO2/Si substrates were highly inert towards oxidation, whereas the other clusters could be oxidized, i.e. the chemical property drastically changed with the number of atoms in a cluster. The size-selectivity in chemical reactivity remained unchanged upon air-exposure. The chemical properties of the deposited Au clusters were unchanged after annealing at 250 °C. Annealing at higher temperatures caused structural changes to the surface, as determined by the oxidation behavior. XPS of the deposited Au clusters upon annealing indicated charge transfer from Au to silica.
Keywords :
SiO2 , Oxidation , Mass-selected clusters , Au
Journal title :
Applied Surface Science
Serial Year :
2009
Journal title :
Applied Surface Science
Record number :
1011590
Link To Document :
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