Title of article :
Epitaxial growth of Bi thin films on Ge(1 1 1)
Author/Authors :
Shinichiro Hatta، نويسنده , , Yoshiyuki Ohtsubo، نويسنده , , Sanae Miyamoto، نويسنده , , Hiroshi Okuyama، نويسنده , , Tetsuya Aruga، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2009
Pages :
5
From page :
1252
To page :
1256
Abstract :
We investigated Bi thin film growth on Ge(1 1 1) by using low-energy electron diffraction (LEED) and scanning tunneling microscopy (STM). In the submonolayer regime, adsorbed Bi atoms form patches of the image structure. However, the structure does not grow to a long-range order. Following the formation of a image monolayer (ML) film, two-dimensional (1 1 0)-orientated Bi islands grow. The film orientation changes from (1 1 0) to (1 1 1) at 6–10 ML. The (1 1 0)-oriented Bi film shows a six-domain LEED pattern with missing spots, associated with a glide-line symmetry. The hexagonal (1 1 1) film at 14 ML has a lattice constant 2% smaller than bulk Bi(1 1 1).
Keywords :
Low-energy electron diffraction , Thin film growth , Bismuth , Ge(1 1 1) , Scanning tunneling microscopy
Journal title :
Applied Surface Science
Serial Year :
2009
Journal title :
Applied Surface Science
Record number :
1011614
Link To Document :
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