Title of article :
A novel sputtering oxidation coupling (SOC) method to fabricate VO2 thin film
Author/Authors :
Xiaofeng Xu، نويسنده , , Anyuan Yin، نويسنده , , Xiliang Du، نويسنده , , Jiqing Wang، نويسنده , , Jiading Liu، نويسنده , , Xinfeng He، نويسنده , , Xingxing Liu، نويسنده , , Yilong Huan، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2010
Pages :
4
From page :
2750
To page :
2753
Abstract :
VO2 thin film synthesized by a novel sputtering oxidation coupling (SOC) method has been successfully fabricated. The experimental results show that the optimum oxidation time is 285 s and the thin film exhibits a good metal-insulator transition (MIT) approximately at 340 K. The corresponding structures and surface compositions of the films have been characterized by X-ray diffractometer and X-ray photoelectron spectroscopy separately.
Keywords :
VO2 thin films , Metal-insulator transition , Sputtering oxidation coupling
Journal title :
Applied Surface Science
Serial Year :
2010
Journal title :
Applied Surface Science
Record number :
1011876
Link To Document :
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