Spectroscopic investigation of the physicochemical origin of the spontaneous delamination of the sputtered amorphous carbon nitride films

We present in this study a spectroscopic investigation of the delamination of the amorphous carbon nitride (a-CNx) films deposited by RF magnetron sputtering of a graphite target in Ar/N2 gas mixture. The microstructure of the studied films have been analysed prior and after their delamination. The origin of the observed spontaneous delamination have been elucidated in terms of chemical reactions between water and CN bonds at the a-CNx/Si interface, which support delamination crack advance.