Title of article
Shallow surface etching of organic and inorganic compounds by electrospray droplet impact
Author/Authors
Kenzo Hiraoka، نويسنده , , Yuji Sakai، نويسنده , , Yoshitoki Iijima، نويسنده , , Daiki Asakawa، نويسنده , , Kunihiko Mori، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2009
Pages
6
From page
8947
To page
8952
Abstract
The electrospray droplet impact (EDI) was applied to bradykinin, polyethylene terephthalate (PET), SiO2/Si, and indium phosphide (InP). It was found that bradykinin deposited on the stainless steel substrate was ionized/desorbed without the accumulation of radiation products. The film thickness desorbed by a single collisional event was found to be less than 10 monolayers. In the EDI mass spectra for PET, several fragment ions were observed but the XPS spectra did not change with prolonged cluster irradiation. The etching rate for SiO2 by EDI was measured to be ∼0.2 nm/min. The surface roughness of InP etched by EDI was found to be one order of magnitude smaller than that etched by 3 keV Ar+ for about the same etching depths. EDI is capable of shallow surface etching with little damage left on the etched surface.
Keywords
Electrospray droplet impact , Cluster ion etching , Shallow surface etching
Journal title
Applied Surface Science
Serial Year
2009
Journal title
Applied Surface Science
Record number
1012192
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