Title of article :
Characterisation of Ni and Ni/Ti contact on n-type 4H-SiC
Author/Authors :
M. Siad، نويسنده , , C. Pineda Vargas، نويسنده , , M. Nkosi، نويسنده , , D. Saidi، نويسنده , , N. Souami، نويسنده , , N. Daas، نويسنده , , A.C. Chami، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2009
Abstract :
In this work, we report on the structural characterisation of Ni and Ni/Ti bilayer contacts on n-type 4H-SiC. The redistribution of carbon, after annealing, in the Ni/SiC and the Ni/Ti/SiC contacts is particularly studied by RBS at 3.2 MeV, XRD and AES techniques.
Keywords :
nickel , Titanium , AES , SiC , RBS , Ohmic contacts , XRD
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
