• Title of article

    Adhesion and stress of magnesium oxide thin films: Effect of thickness, oxidation temperature and duration

  • Author/Authors

    Sikandar H. Tamboli، نويسنده , , Vijaya Puri، نويسنده , , R.K. Puri، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2010
  • Pages
    4
  • From page
    4582
  • To page
    4585
  • Abstract
    Nanoscale magnesium oxide thin films have been deposited on glass substrate by thermal oxidation (in air) of vacuum evaporated magnesium films. X-ray diffraction (XRD) showed orientation along (2 0 0) and (2 2 0) directions. The mechanical properties of the MgO thin films were found to be the function of thickness (300, 450 and 600 nm), oxidation temperature (573, 623 and 673 K) and oxidation duration (90 and 180 min). As oxidation temperature and oxidation duration increases, adhesion and intrinsic stress were found to increase. Intrinsic stress decreased whereas adhesion increased due to increase in thin film thickness. The value of intrinsic stress was in range 28.902–73.212 (×107 N/m2) and that of adhesion was 12.1–27.4 (×104 N/m2) for the thin film of thickness 300 nm.
  • Keywords
    Thin films , Oxide materials , Intrinsic stress , Adhesion , Vapour deposition
  • Journal title
    Applied Surface Science
  • Serial Year
    2010
  • Journal title
    Applied Surface Science
  • Record number

    1012731